plasmaimpax® and pulsed laser deposition

The patented plasmaimpax process uses high-energy particles and high-voltage pulse technology for ion implantation and ion-assisted coating at low temperatures. In addition there is pulsed laser ablation (PLD): short-wave UV light brings the target material into the gas phase and onto the workpiece as a coating — with laser energies of up to 1 J per pulse and up to 300 Hz, the most flexible PVD process.